Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-05-12
2000-07-04
Dang, Thi
Coating apparatus
Gas or vapor deposition
With treating means
H05H 100, C23C 1600
Patent
active
060822945
ABSTRACT:
An apparatus for depositing diamond film is disclosed, which comprises: a chamber; a reaction zone in the chamber; means for feeding diamond forming gases and an electron source gas into the reaction zone; means for applying an electric field across the reaction zone to accelerate free electrons of the electron source gas and dissociate hydrogen in the diamond forming gases to produce atomic hydrogen; and a deposition surface adjacent the reaction zone, whereby diamond film is deposited on the deposition surface from the diamond forming gases, assisted by the atomic hydrogen.
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Dang Thi
Saint-Gobain Industrial Ceramics, Inc.
Ulbrich Volker R.
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