Method for producing metal patterns on silicon wafers for thermo

Details Method for producing metal patterns on silicon wafers for thermo Method for producing metal patterns on silicon wafers for thermo

1978-09-15

1980-04-22

Ozaki, G.

Metal treatment

Compositions

Heat treating

148171, 148178, 148188, 1566591, 156660, H01L 21225

Patent

active

041993799

ABSTRACT:
A method of producing metal patterns on silicon wafers prior to a thermomigration process, including covering the surface of a wafer completely with a metal film, producing a photoresist pattern on portions of the metal film corresponding to a predetermined thermomigration pattern, etching away the uncovered portions of the metal film, removing the photoresist film, and annealing the remaining metal film pattern.

REFERENCES:
patent: 2813048 (1957-11-01), Pfann
patent: 3269861 (1966-08-01), Schneble et al.
patent: 3806361 (1974-04-01), Lehner
patent: 3901736 (1975-08-01), Anthony et al.
patent: 3998662 (1976-12-01), Anthony et al.
patent: 4012236 (1977-03-01), Anthony et al.
patent: 4040878 (1977-08-01), Rowe

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