Process and apparatus for the removal of vaporized contaminants

Gas separation – Means within gas stream for conducting concentrate to collector

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55 1, 55407, 73488, 74 5R, 74 57, 277 1, 308122, B01D 5700

Patent

active

041993292

ABSTRACT:
An eliminator of vaporized contaminants from gas in a closed system in which high pressure gas is subjected to a substantially adiabatic expansion with accompanying temperature drop at a point where the contaminants cannot cause problems. In the specific case of a gas bearing, contaminants which normally condense in the gap between bearing surfaces are caused to condense at points well removed from the bearing gap where they cannot cause failure of the gas bearing. A remotely located expansion chamber or zone is created and it may include a restricting orifice at the inlet to which gas pressure is relatively high and at the outlet of which pressure is significantly lower. The pressure drop is accompanied by a comparably large decrease in temperature to a point at which the vaporized contaminants condense. A filter may be included at or adjacent to the outlet to trap the condensed contaminants.

REFERENCES:
patent: 940885 (1909-11-01), Mazza
patent: 2822223 (1958-02-01), Offen
patent: 2926898 (1960-03-01), Taylor
patent: 2940318 (1960-06-01), Adams et al.
patent: 3082009 (1963-03-01), Whitley et al.
patent: 3129037 (1964-04-01), Ott
patent: 3303485 (1967-02-01), Lee
patent: 3626664 (1971-12-01), Hoffstrom
patent: 3631423 (1971-12-01), Groom
patent: 3721479 (1973-03-01), Rasnick et al.
patent: 3724181 (1973-04-01), Benson, Jr.
patent: 3857687 (1974-12-01), Hamilton et al.
patent: 3982441 (1976-09-01), Widner
patent: 3985034 (1976-10-01), Widner
patent: 4041779 (1977-08-01), Greb

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