Self-alignment process usable in microelectronics, and applicati

Details Self-alignment process usable in microelectronics, and applicati Self-alignment process usable in microelectronics, and applicati

1997-12-17

1999-11-09

Gupta, Yogendra

Semiconductor device manufacturing: process

Electron emitter manufacture

438638, 438738, 216 2, 216 11, 445 24, 445 50, H01L 2100, H01L 214763, H01L 21302, C23F 100

Patent

active

059813040

ABSTRACT:
Self-alignment process usable in microelectronics to obtain alignment of at least one group of holes, one of said holes (or large diameter hole) being formed in an upper level and the other hole (or small diameter hole) being formed in a lower level of a stacked structure. The process consists of:

REFERENCES:
patent: 5676818 (1997-10-01), Delapierre et al.

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