Scanning exposure method utilizing identical scan direction acro

Details Scanning exposure method utilizing identical scan direction acro Scanning exposure method utilizing identical scan direction acro

1998-06-18

1999-11-09

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 30, G03F 900

Patent

active

059811170

ABSTRACT:
A mask pattern is transferred onto a wafer by exposure with a mask stage and a wafer stage being moved synchronously. In global alignment of the mask and the wafer, the scanning direction in the present (second layer) scanning exposure is made coincident with the scanning direction in the preceding (first layer) scanning exposure. When alignment is made by calculating shot array coordinates in advance, shot array coordinates are calculated for each scanning direction.

REFERENCES:
patent: 4924257 (1990-05-01), Jain
patent: 5194893 (1993-03-01), Nishi

Affiliated with

Also associated with

Rating

Scanning exposure method utilizing identical scan direction acro does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Scanning exposure method utilizing identical scan direction acro, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scanning exposure method utilizing identical scan direction acro will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1453445