Composition and slurry useful for metal CMP

Details Composition and slurry useful for metal CMP Composition and slurry useful for metal CMP

1997-04-08

1999-11-09

Breneman, Bruce

Compositions

Etching or brightening compositions

438692, 438693, 216 89, 106 3, 51308, 51309, C09K 1300

Patent

active

059807750

ABSTRACT:
A chemical mechanical polishing composition comprising an oxidizing agent at least one catalyst having multiple oxidation states, and at least one stabilizer, the composition being useful when combined with an abrasive or with an abrasive pad to remove metal layers from a substrate.

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Cabot Corporation Semi-Sperse.TM. W-A355 Polishing Slurry for Tungsten CMP product literature.
Cabot Corporation Semi-Sperse.TM. FE-10 Oxidizer Solution for Tungsten CMP product literature.
Cabot Corporation General Information on Semi-Sperse.TM. W-A355 Polishing Slurry for Tungsten CMP product literature.
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