Double window exhaust arrangement for wafer plasma processor

Details Double window exhaust arrangement for wafer plasma processor Double window exhaust arrangement for wafer plasma processor

1997-01-30

1999-11-09

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

118715, 156345, C23C 1600

Patent

active

059806389

ABSTRACT:
A plasma ashing chamber that uses an external radiant power source to uniformly heat the wafer is provided with a double plate window through which radiant heat and exhaust gases flow without interfering with each other.

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