Manufacture of planar photonic integrated circuits

Details Manufacture of planar photonic integrated circuits Manufacture of planar photonic integrated circuits

1997-03-28

1999-01-26

Bowers, Charles

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

438 29, 438 31, 438 42, 438 44, 372 43, 372 44, 372 46, 372 50, 385 14, H01L 21308

Patent

active

058638091

ABSTRACT:
The specification describes photonic integrated circuit structures, and methods for making structures in which the active and passive waveguides are coplanar, and further in which all the layers of both the active and passive device regions are essentially coplanar, resulting in a planar surface and design flexibility for contact pad and metallization placement. The fabrication strategy eliminates the deep etch used in conventional processing to form laser devices, and thereby eliminates the step between the laser mesa and the passive waveguide sections.

REFERENCES:
patent: 4884119 (1989-11-01), Miller
patent: 5288659 (1994-02-01), Koch et al.

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