Etching method and process for producing a semiconductor element

Electrolysis: processes – compositions used therein – and methods – Electrolytic erosion of a workpiece for shape or surface... – Gap maintenance or defined tool-workpiece gap

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205656, 205659, 205674, 205685, C25F 302, C25F 312

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active

058634126

ABSTRACT:
A method for etching an object having a portion to be etched on the surface thereof, comprising a step of immersing said object in an electrolyte solution such that said object serves as a negative electrode; a step of arranging a counter electrode having a pattern corresponding to a desired etching pattern to be formed at said portion to be etched of said object in said electrolyte solution so as to maintain a predetermined interval between said counter electrode and said object, and a step of applying a direct current or a pulse current between said object and said counter electrode to etch said portion to be etched of said object into a pattern corresponding to said pattern of said counter electrode.

REFERENCES:
patent: 4166918 (1979-09-01), Nostrand et al.
patent: 4419530 (1983-12-01), Nath
patent: 4729970 (1988-03-01), Nath et al.
patent: 5084400 (1992-01-01), Nath et al.
patent: 5320723 (1994-06-01), Kawakami
patent: 5352341 (1994-10-01), Joyner

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