Plasma processing apparatus for etching, ashing and film-formati

Details Plasma processing apparatus for etching, ashing and film-formati Plasma processing apparatus for etching, ashing and film-formati

1990-01-12

1991-06-18

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118 501, 118623, 118728, 156643, 156646, B44C 122, B05B 5025, B05C 502, C23C 1400

Patent

active

050247166

ABSTRACT:
A plasma processing apparatus includes a vacuum vessel defining a discharge chamber and is provided at least with a source gas supply for supplying a processing gas into the discharge chamber, a magnetic field creating device, and a microwave introducing device. The microwave introducing device employs a microwave radiating member having the shape of a flat plate and provided with a cut. The plasma processing apparatus is capable of uniformly processing a work with a plasma and efficiently applying a microwave only to the work. The periphery of a microwave transmission window is tapered, so that the microwave transmission window can be attached, adhesively and hermetically, to a microwave launcher in a simple construction, whereby the reliability of the adhesive attachment of the microwave transmission window to the microwave launcher is enhanced.

REFERENCES:
patent: 4761199 (1988-08-01), Sato
patent: 4776918 (1988-10-01), Otsubo et al.

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