Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Antihalation or filter layer containing
Patent
1981-08-10
1982-11-16
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Antihalation or filter layer containing
430931, 523135, G03C 178
Patent
active
043595235
ABSTRACT:
Light-sensitive photographic material which contains a non-light sensitive uv-filter layer comprising a compound of the general formula ##STR1## wherein R.sub.1 is alkyl or a group of the formula ##STR2## wherein R.sub.6 is alkylene and R.sub.7 and R.sub.8 are each alkyl or one of R.sub.7 and R.sub.8 can be hydrogen, R.sub.2 and R.sub.3 are each hydrogen or alkoxy, Z is oxygen or sulphur, Y is oxygen or sulphur or a group --NR.sub.5 --, wherein R.sub.5 is hydrogen or optionally substituted alkyl, aryl or carboxyalkyl, and R.sub.4 is hydrogen or optionally substituted alkyl, aryl or carboxyalkyl. These compounds exhibit a very sharp cut-off point at about 400 nm.
REFERENCES:
patent: 4052216 (1977-10-01), Sobel et al.
patent: 4245018 (1981-01-01), Hara et al.
patent: 4309500 (1982-01-01), Shishido
Brammer Jack P.
Ciba-Geigy AG
Kolodny Joseph G.
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