Method of improving the light resistance of a dye image

Radiation imagery chemistry: process – composition – or product th – Color imaging process – Stabilizing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430386, 430551, 430554, 430555, 430558, G03C 740, G03C 726

Patent

active

045406537

ABSTRACT:
A photographic element comprising a support having thereon a layer containing a dye that is formed by the reaction of an anilino-type magenta coupler with the oxidized product of a color developing agent, the said layer comprising an organic solvent having a dielectric constant of not more than 6.5 and at least one of metallic complexes having the following Formula [I], Formula [II] or Formula [III]: ##STR1## In Formulas [I], [II] and [III], M is a nickel atom, copper atom, cobalt atom, palladium atom or platinum atom; X.sub.1 and X.sub.2 each is an oxygen atom, sulfur atom or --NR.sub.5 -- (wherein R.sub.5 is a hydrogen atom, an alkyl, aryl or hydroxyl radical); X.sub.3 is a hydroxyl or mercapto radical; Y is an oxygen atom or sulfur atom; R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each is a hydrogen atom or a halogen atom or a cyano radical, or an alkyl, aryl, cycloalkyl or heterocyclic radical which each is bonded directly or through a divalent combining radical to a carbon atom; and at least one of the R.sub.1 -R.sub.2 and R.sub.3 -R.sub.4 combinations is allowed to form a 5- or 6-member cyclic ring together with the carbon atoms which are bonded with each other; and Z is a compound coordinateable to M.

REFERENCES:
patent: 4245018 (1981-01-01), Hara et al.
patent: 4326022 (1982-04-01), Ito et al.
patent: 4346165 (1982-08-01), Sawada et al.
patent: 4369243 (1983-01-01), Credner et al.
patent: 4407940 (1983-10-01), Nakamura et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of improving the light resistance of a dye image does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of improving the light resistance of a dye image, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of improving the light resistance of a dye image will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1428513

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.