Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1987-06-05
1989-11-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430166, 430190, 430192, G03C 160
Patent
active
048822604
ABSTRACT:
The photosensitive composition, which is suitable as a photoresist material in fine patterning works for the manufacture of semiconductor devices, contains, as a photoextinctive agent, a combination of an alkali-insoluble dye and an alkali-soluble dye each having absorptivity of light in the wavelength region from 230 to 500 nm in a specified amount and in a specified ratio between them. By virtue of the formulation of combined dyes, the undesirable phenomenon of halation by the underlying aluminum coating layer on the substrate surface is greatly decreased so that patterned resist layer obtained with the composition is a high-fidelity reproduction of the original pattern even in a submicron range of fineness with good rectangularity of the cross sectional form of the patterned lines.
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Carlson, Bob et al., "Control of One Micron Lines in Integrated Circuits", Honeywell SSEC, Plymouth, Minnesota, Received by PTO on 6/7/85.
Arai Yoshiaki
Asaumi Shingo
Kohara Hidekatsu
Miyabe Masanori
Nakayama Toshimasa
Bowers Jr. Charles L.
Tokyo Ohka Kogyo Co. Ltd.
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