Method for batch fabricating semiconductor devices

Electrical resistors – Strain gauge type

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29578, 29580, 29583, G01L 122

Patent

active

041032730

ABSTRACT:
A method for batch fabricating semiconductor stress sensors having the semiconductor material diaphragm rigidly joined to a support flange made of the same semi-conducting material. Two processed silicon slices, one to form diaphragms and the other to form support flanges, are rigidly joined. The joined slices are then partitioned to form individual stress sensors.

REFERENCES:
patent: 3139598 (1964-06-01), Ruge
patent: 3401449 (1968-09-01), Shaw
patent: 3417361 (1968-12-01), Heller et al.
patent: 3427708 (1969-02-01), Schutz

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for batch fabricating semiconductor devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for batch fabricating semiconductor devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for batch fabricating semiconductor devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1424529

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.