Semiconductor device having compound semiconductor FET of E/D st

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 16, 357 4, 357 56, H01L 2980

Patent

active

050437763

ABSTRACT:
The semiconductor device of the present invention includes on one and the same substrate a first transistor having a first semiconductor layer with high-impurity density on which is provided a second semiconductor layer with low-impurity density, where the first semiconductor layer being of N type and having electron affinity greater than that of the second semiconductor layer, and is equipped with a control electrode provided on the second semiconductor layer and at least two ohmic electrodes that are electrically connected to the first semiconductor layer on both sides of the control electrode, and a second transistor having a third semiconductor layer with low-impurity density provided on top of the second semiconductor layer on the first semiconductor layer, and is equipped with a control electrode provided on the third semiconductor layer and at least two ohmic electrodes that are electrically connected to the first semiconductor layer on both sides of the control electrode. Further, by setting the first semiconductor layer to be a P-type semiconductor having the sum of the electron affinity and the energy gap smaller than the sum of the electron affinity and the energy gap of the second semiconductor layer, there can be obtained a semiconductor using holes as carriers.

REFERENCES:
patent: 4605945 (1986-08-01), Katayama et al.
patent: 4636822 (1987-01-01), Codella et al.
patent: 4733283 (1988-03-01), Kuroda
patent: 4742379 (1988-05-01), Yamashita et al.
patent: 4771324 (1988-09-01), Odani et al.
New Device Structure for 4Kb HEMT SRAM, S. Kuroda, et al., GaAs IC Symposium, pp. 125-128, (1984).
A New Low-Noise AlGaAs/GaAs 2DEG FET with a Surface Undoped Layer, Hikaru Hida, et al., reprinted from IEEE Transactions on Electron Devices, vol. ED-33, No. 5, May 1986; pp. 601-607.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device having compound semiconductor FET of E/D st does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device having compound semiconductor FET of E/D st, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device having compound semiconductor FET of E/D st will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1417803

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.