Photosensitive compositions containing a polymer with carboxyl a

Details Photosensitive compositions containing a polymer with carboxyl a Photosensitive compositions containing a polymer with carboxyl a

1994-04-14

1996-03-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

4302811, 4302861, 4302871, 522 31, 522 32, 522 65, 522158, G03F 7021, G03F 7029, G03F 7032

Patent

active

054966787

ABSTRACT:
A photosensitive composition which comprises, as essential components:
(A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxyl group(s) and (A") a polymer having hydroxyphenyl group(s),
(B) a compound having at least two vinyl ether groups in the molecule, and
(C) a compound which generates an acid when irradiated with an actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.

REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 5364738 (1994-11-01), Kondo et al.
patent: 5366846 (1994-11-01), Knudsen et al.

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