Method and apparatus for controlling ion implantation unit for e

Details Method and apparatus for controlling ion implantation unit for e Method and apparatus for controlling ion implantation unit for e

1994-12-14

1996-03-05

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

118665, 118688, 118715, 4272481, C23C 1400

Patent

active

054965926

ABSTRACT:
In controlling an ion implantation unit, a dose of ions is calculated for every lot, and it is determined whether or not the dose D of ions is within an allowable range. When the dose of ions is within the allowable range, the ion implantation unit is operated for the next lot. When the dose of ions is not within the allowable range, the ion implantation unit is stopped.

Affiliated with

Also associated with

Rating

Method and apparatus for controlling ion implantation unit for e does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for controlling ion implantation unit for e, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for controlling ion implantation unit for e will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1411483