Positive resist composition containing a novolak resin made from

Details Positive resist composition containing a novolak resin made from Positive resist composition containing a novolak resin made from

1993-11-29

1995-03-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430193, 528153, 528155, G03F 7023, G03F 730

Patent

active

053957270

ABSTRACT:
A novolak resin made from a carbonyl compound and a specific phenol compound, which resin has good properties, in particular, as a base resin of a photoresist.

REFERENCES:
patent: 4102686 (1978-07-01), Weinberger et al.
patent: 4179429 (1979-12-01), Hanauye et al.
patent: 4232134 (1980-11-01), Schmidt et al.
patent: 4241201 (1980-12-01), Annis
patent: 4268648 (1981-05-01), Freitag et al.
patent: 4871646 (1989-10-01), Hayase et al.
patent: 5112719 (1992-05-01), Yamada et al.
W. S. DeForest, "Photoresist Materials & Processes", McGraw-Hill Book Co., pp. 54-62 (1975).
Journal of Japan Printing Society, vol. 28, No. 5.

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