Radiation curable coating

Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

260 4228, 260836, 260837R, 427 36, 427 44, 427 54, 428413, 428457, 428473, 428511, C08F 800

Patent

active

040725928

ABSTRACT:
A radiation curable coating composition for various substrates containing an adduct of acrylic acid and an epoxy resin (which may be modified with an anhydride, such as maleic anhydride), and a reactive acrylate monomer vehicle. The coating composition can be pigmented and can also contain additives commonly used in coatings, such as wetting agents and flow control agents. The coating composition does not require the usual hydrocarbon vehicles that give rise to air pollution problems. Surface gloss of a UV cured film obtained from a pigmented coating composition can be increased by using a photosensitizer combination of 2-chlorothioxanthone and a phenyl ketone, such as benzophenone. Adhesion of a cured coating is improved by replacing the tertiary amine co-sensitizer, at least in part, with dimethylaminoethyl acrylate.

REFERENCES:
patent: 3773856 (1973-11-01), Takiyama et al.
patent: 3840448 (1974-10-01), Osborn et al.
patent: 3847771 (1974-11-01), McGinniss
patent: 3878076 (1975-04-01), Nishikubo et al.
patent: 3878077 (1975-04-01), Borden et al.
patent: 3882187 (1975-05-01), Takiyama et al.
patent: 3912670 (1975-10-01), Huemmer et al.
patent: 3915824 (1975-10-01), McGinniss

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Radiation curable coating does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation curable coating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation curable coating will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1399930

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.