Fabrication of silicon microclusters and microfilaments

Details Fabrication of silicon microclusters and microfilaments Fabrication of silicon microclusters and microfilaments

1995-08-24

1997-01-14

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Chemical vapor deposition

427561, 427583, 427596, C23C 800, C23C 1430, H05B 700

Patent

active

055937420

ABSTRACT:
An ablation process by which fused deposits of silicon particles are accuated on a substrate of selected material in accordance with whether microclusters of spherical configurations or microfilaments of cylindrical configurations are to be fabricated. Silicon ablation is accomplished in an inert gas atmosphere with an excimer laser that generates light pulses of which the wavelength and frequency are controlled to fix the energy level thereof. The pressure of the inert gas atmosphere is also controlled in accordance with whether microclusters or microfilaments are to be fabricated.

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patent: 4959242 (1990-09-01), Itoh
patent: 5096739 (1992-03-01), Strutt et al.
patent: 5103284 (1992-04-01), Ovshinsky et al.
patent: 5254832 (1993-10-01), Gartner et al.

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