Light-sensitive compound mixture and copying material comprising

Details Light-sensitive compound mixture and copying material comprising Light-sensitive compound mixture and copying material comprising

1982-01-11

1986-12-09

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 430302, 430326, 534557, G03C 154, G03C 194, C07C11300

Patent

active

046280200

ABSTRACT:
A light-sensitive mixture comprising a light-sensitive naphthoquinone-diazide-sulfonic acid ester corresponding to the formula: ##STR1## wherein D represents a 1,2-naphthoquinone-2-diazide-5-sulfonyl or -4-sulfonyl radical; R.sub.1, R.sub.2, R.sub.3, R.sub.1 ', R.sub.2 ' and R.sub.3 ' each represent hydrogen, halogen, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO and n represents an integer from 2 to 18; not more than three DO radicals in total being present on one benzene ring. The mixture is useful for preparing printing plates or photoresists.

REFERENCES:
patent: 3046118 (1962-07-01), Schmidt
patent: 3647443 (1972-03-01), Rauner et al.
patent: 3785825 (1974-01-01), Deutsch et al.
patent: 3802885 (1974-04-01), Lawson et al.
patent: 4005437 (1977-01-01), Ross et al.
patent: 4197128 (1980-04-01), Watanabe et al.
patent: 4266001 (1981-05-01), Buhr et al.

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