Process and apparatus for producing a functional structure of a

Coating processes – Direct application of electrical – magnetic – wave – or... – Resistance heating

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427572, 427586, 438792, 2041921, B05D 512

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057259143

ABSTRACT:
In order to improve a process and an apparatus for producing a functional structure of a semiconductor component, which comprises layers arranged on a base substrate and defining the entire functions of the semiconductor component, such that the functional structure of the semiconductor components can be produced as simply as possible and with as little susceptibility as possible with respect to the quality of the semiconductor components it is suggested that all the layers be produced without lithography and applied to the base substrate one after the other exclusively with physical layer application processes.

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