Topography simulation method

Details Topography simulation method Topography simulation method

1989-09-21

1991-11-19

Cangialosi, Salvatore

Boots, shoes, and leggings

364488, G06F 1572

Patent

active

050671014

ABSTRACT:
A topography simulation method enables estimation of the three-dimensional shape of a surface of a workpiece where material removal by a predetermined process takes place. This simulation method includes the steps of dividing a region of the workpiece to be removed into a plurality of partial regions; setting a diffusion coefficient for each partial region with a diffusion component contributing to material removal, and calculating a contour surface of the concentration of the diffusion component by a process which employs modified diffusion equations. The contour surface obtained the surface after material removal.

REFERENCES:
patent: 4868770 (1989-09-01), Smith et al.
patent: 4868771 (1989-09-01), Quick et al.
patent: 4879667 (1989-11-01), Gorski et al.
patent: 4888583 (1989-12-01), Ligocki et al.
Shephard: Finite Element Modeling Within an Integrated Geometric Modeling Environment: Part I-Mesh Generation, Engineering with Computers, pp. 61-70, Springer 1985.
Oldham et al., "A General Simulator . . . Lithography", IEEE Transactions on Electron Devices, vol. ED-26, No. 4, Apr. 1979, pp. 717-722.
Hirai et al., "Three Dimensional Process . . . Effects", IEEE Catalogue, No. 87th 0189-01, 1987, pp. 15-16.
Matsuzawa et al., "Three-Dimensional Photoresist . . . Surfaces", IEEE Transactions on Electron Devices, vol. ED-32, No. 9, Sep. 1985, pp. 1781-1783.

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