GaAs MESFET

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 16, 357 234, 357 56, H01L 29205, H01L 2980

Patent

active

048050032

ABSTRACT:
A vertical III-V compound MESFET is provided. The MESFET has a buried P-type layer which separates the source and the drain regions. A small N-type region in the buried P layer connects the source channel to the drain area. This opening in the buried P layer is located underneath the Schottky gate.

REFERENCES:
patent: 4404575 (1983-09-01), Nishizawa
patent: 4561168 (1985-12-01), Pitzer et al.
patent: 4568958 (1986-02-01), Baliga
patent: 4587540 (1986-05-01), Jackson
patent: 4624004 (1986-11-01), Calviello
patent: 4636823 (1987-01-01), Margalit
patent: 4746960 (1988-05-01), Valeri et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

GaAs MESFET does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with GaAs MESFET, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and GaAs MESFET will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1369694

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.