Fishing – trapping – and vermin destroying
Patent
1994-08-22
1996-02-20
Fourson, George
Fishing, trapping, and vermin destroying
437235, 437238, 437228, H01L 2144
Patent
active
054928648
ABSTRACT:
An object of the present invention is to realize a method of and equipment for manufacturing a semiconductor device which can improve the flatness of an interlayer insulating film and increase the reliability of the metal wiring of a second layer to be formed in a succeeding process. The method of manufacturing the semiconductor device of the present invention is characterized by a manufacturing process to be successively implemented comprising: a step for forming an insulating film by means of a chemical vapor deposition method on a semiconductor substrate having an electrode patterned thereon; a step for selectively removing the insulating film by using a reactive ion etching method and forming a side wall made of the insulating film on the patterned electrode; and a step for forming the insulating film by means of the chemical vapor deposition method while introducing excited halogen molecules at an excited molecule oscillation level.
REFERENCES:
patent: 5204288 (1993-04-01), Marks et al.
patent: 5275977 (1994-01-01), Otsubo et al.
patent: 5352630 (1994-10-01), Kim et al.
Semicon News, dated Jun. 1989, pp. 62-67.
Everhart C.
Fourson George
NEC Corporation
LandOfFree
Method and equipment for manufacturing a semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and equipment for manufacturing a semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and equipment for manufacturing a semiconductor device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1355805