Image forming method of exposing and heating light-sensitive mat

Details Image forming method of exposing and heating light-sensitive mat Image forming method of exposing and heating light-sensitive mat

1991-09-09

1993-03-23

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Microcapsule, process, composition, or product

430203, 430253, 430254, 430278, 430281, 430350, 430353, 430526, 430531, G03C 172

Patent

active

051962888

ABSTRACT:
An image forming method of imagewise exposing and heating a light-sensitive material is disclosed. The light-sensitive material comprises a support and a light-sensitive layer provided thereon. The light-sensitive layer contains silver halide, a reducing agent, an ethylenically unsaturated polymerizable compound, a color image forming substance and a base precursor. The silver halide, the reducing agent, the polymerizable compound, the color image forming substance and the base precursor are contained in microcapsules which are dispersed in the light-sensitive layer. According to the present invention, the support is made of a thin polymer film having a thickness of not more than 75 .mu.m. The light-sensitive material is heated from the side of the support for 0.1 to 5 seconds.

REFERENCES:
patent: 4910117 (1990-03-01), Dowler et al.
patent: 4939064 (1990-07-01), Nakamura
patent: 5073472 (1991-12-01), Yamamoto

Affiliated with

Also associated with

Rating

Image forming method of exposing and heating light-sensitive mat does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Image forming method of exposing and heating light-sensitive mat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image forming method of exposing and heating light-sensitive mat will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1350766