Method and apparatus for inspecting a photoresist material by in

Details Method and apparatus for inspecting a photoresist material by in Method and apparatus for inspecting a photoresist material by in

1997-04-02

1999-11-16

Johns, Andrew W.

Image analysis

Applications

Manufacturing or product inspection

348131, G06K 900

Patent

active

059871601

ABSTRACT:
A method and apparatus for inspecting a substrate having a surface on which a photoresist material has been deposited. The apparatus preferably includes a device for transporting substrates through an illumination beam such that the edges of the substrates are sequentially irradiated by the beam without requiring that each substrate be individually manipulated. The illumination beam is generated and projected onto the substrates by equipment configured to produce a beam having a size, wavelength, and intensity sufficient to cause the photoresist material to fluoresce with an intensity that can be detected without magnification. Inspection can be performed manually or automated through optical equipment that can detect flaws in the photoresist based on knowledge of the patterned image desired for the photoresist.

REFERENCES:
patent: 5161201 (1992-11-01), Kaga et al.
patent: 5265170 (1993-11-01), Hine et al.
patent: 5576948 (1996-11-01), Stern et al.
patent: 5598345 (1997-01-01), Tokura
patent: 5607800 (1997-03-01), Ziger

Affiliated with

Also associated with

Rating

Method and apparatus for inspecting a photoresist material by in does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for inspecting a photoresist material by in, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for inspecting a photoresist material by in will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1334548