Electric heating – Metal heating – By arc
Patent
1998-05-08
2000-03-28
Paschall, Mark
Electric heating
Metal heating
By arc
21912141, 219502, 392416, 118 501, 2504941, 2504922, H05B 102, H01L 2120
Patent
active
060434503
ABSTRACT:
An apparatus for heating, according to a predetermined heating profile, a surface carrying a film. The invention includes a source of radiant energy. The source of radiant energy has several peak wavelengths, with each peak wavelength having a unique absorption profile related to the thickness of the film. The source of radiant energy is positioned to direct radiant energy toward the surface. Means are included for holding the source of radiant energy in a manner such that the combination of peak wavelengths produce the desired predetermined heating profile.
REFERENCES:
patent: 3836751 (1974-09-01), Anderson
patent: 4543472 (1985-09-01), Arai et al.
patent: 4680451 (1987-07-01), Gat et al.
patent: 4842686 (1989-06-01), Davis et al.
patent: 5073698 (1991-12-01), Stultz
patent: 5108792 (1992-04-01), Anderson et al.
patent: 5138973 (1992-08-01), Davis et al.
patent: 5155337 (1992-10-01), Sorrell
patent: 5179677 (1993-01-01), Anderson et al.
patent: 5336641 (1994-08-01), Fair et al.
patent: 5393564 (1995-02-01), Westmoreland et al.
patent: 5399379 (1995-03-01), Sandhu
patent: 5444217 (1995-08-01), Moore et al.
patent: 5446825 (1995-08-01), Moslehi et al.
patent: 5493987 (1996-02-01), McDiarmid et al.
patent: 5504831 (1996-04-01), Sandhu et al.
patent: 5650630 (1997-07-01), Dierks et al.
patent: 5751896 (1998-05-01), Sandhu
Micro)n Technology, Inc.
Paschall Mark
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