Surface machining method and apparatus

Abrading – Machine – Rotary tool

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Details

451288, 451 41, 451 60, 451 63, 451271, 451291, B24B 501

Patent

active

060424591

ABSTRACT:
A wafer is rotated on its axis, which is biased with regard to an axis of a grinding wheel, and revolves around an axis which is biased with regard to the axis of the wafer and the axis of the grinding wheel. In this state, the grinding wheel is abutted against the surface of the wafer. Thus, all abrasive grains on the grinding wheel can act on the whole surface of the wafer.

REFERENCES:
patent: 3500588 (1970-03-01), Fischer
patent: 4211041 (1980-07-01), Sakulevich et al.
patent: 4615145 (1986-10-01), Matsumoto et al.
patent: 4726150 (1988-02-01), Nishio et al.
patent: 4916868 (1990-04-01), Wittstock
patent: 4979334 (1990-12-01), Takahashi
patent: 5516328 (1996-05-01), Kawada

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