Fishing – trapping – and vermin destroying
Patent
1988-08-12
1989-08-01
Chaudhuri, Olik
Fishing, trapping, and vermin destroying
437 67, 437 72, H01L 2176
Patent
active
048533440
ABSTRACT:
A process is disclosed for forming an isolation region in a substrate of an integrated circuit structure while minimizing the creation of stress in the substrate which comprises forming a first mask over a portion of the substrate where an isolation region is to be formed, forming an isolation slot in the substrate through an opening in the mask, oxidizing the walls of said isolation slot, removing the first mask, growing an epitaxial layer over the substrate which fills or covers the remainder of the isolation slot, forming a second mask over the epitaxial layer with an oversize opening therein over the isolation slot beneath the epitaxial layer, and oxidizing the exposed portion of the epitaxial layer through the opening in the second mask to form an oxide cap over the isolation slot which extends downwardly through the epitaxial layer to the oxide in the isolation slot.
REFERENCES:
patent: 4256514 (1981-03-01), Pogge
patent: 4381956 (1983-05-01), Lane
patent: 4473598 (1984-09-01), Ephrath et al.
patent: 4528047 (1985-07-01), Beyer et al.
patent: 4554728 (1985-11-01), Shepard
patent: 4639288 (1987-01-01), Price et al.
Advanced Micro Devices , Inc.
Chaudhuri Olik
Taylor John P.
LandOfFree
Method of integrated circuit isolation oxidizing walls of isolat does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of integrated circuit isolation oxidizing walls of isolat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of integrated circuit isolation oxidizing walls of isolat will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-131399