Method of locally providing metal on a surface of a substrate

Radiation imagery chemistry: process – composition – or product th – Post imaging processing – Physical developing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430414, 430417, 430422, 427 98, 4274431, 427437, G03F 700

Patent

active

048533203

ABSTRACT:
A method of locally providing metal on a surface of a substrate, in which the substrate is provided at the surface with an electrocatalythic image. The surface is then brought into contact with an electroless metal-plating solution. The electrocatalythic image is capable of binding metal to it from the metal-plating solution. Due to the fact that the image is brought into contact with the metal-plating solutin, the image is gradually strengthened with metal from the solution. With images smaller than 10 .mu.m, this strengthening is prevented, however, due to the fact that oxygen is present in the solution. Because oxygen is reduced, a reduction of metal ions in the solution cannot occur, as a result of which no metal deposition takes place on the image. According to the invention, the reduction of oxygen in the solution is counteracted at least relatively so that also in the case of images smaller than 10 .mu.m metal ions are reduced without hindrance to the metal, which is then deposited on the image. This images smaller than 10 .mu.m can be strengthened too.

REFERENCES:
patent: 2938805 (1960-05-01), Agens
patent: 3300335 (1967-01-01), Horvath
patent: 3454416 (1969-07-01), Heymann
patent: 3666527 (1972-05-01), Feldstein et al.
patent: 3900599 (1975-08-01), Feldstein
patent: 4133908 (1979-01-01), Madsen
patent: 4152467 (1979-05-01), Alpaugh etal.
patent: 4192764 (1980-03-01), Madsen
patent: 4426442 (1984-01-01), Molenaar et al.
patent: 4550036 (1985-10-01), Ludwig et al.
patent: 4579804 (1986-04-01), Takeuchi et al.
patent: 4684545 (1987-08-01), Fey et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of locally providing metal on a surface of a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of locally providing metal on a surface of a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of locally providing metal on a surface of a substrate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-131128

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.