Method of producing semiconductor device having a side wall film

Details Method of producing semiconductor device having a side wall film Method of producing semiconductor device having a side wall film

1993-12-02

1995-06-13

Quach, T. N.

Fishing, trapping, and vermin destroying

437 43, 437195, 437228, H01L 218232, H01L 218242

Patent

active

054242371

ABSTRACT:
A semiconductor device includes a semiconductor substrate, an insulation film formed on the semiconductor substrate, a film formed on the insulation film having a side wall, and a side wall film formed on the insulation film so as to surround the side wall of the film. The side wall film has a slope and satisfies a condition a>d, where a is a width of a bottom surface of the side wall film which is in contact with the insulation film, and d is a thickness of the film.

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