Positive type quinonediazide resist composition containing alkal

Details Positive type quinonediazide resist composition containing alkal Positive type quinonediazide resist composition containing alkal

Filed on

1993-02-25

Date issued

1995-06-13

Examiner

Bowers, Jr., Charles L.

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Diazo reproduction, process, composition, or product

SubSubClass

Composition or product which contains radiation sensitive...

Other Related Categories

430165, 430192, 430193, G03F 7023

Type

Patent

Status

active

Patent number

054241677

Description

ABSTRACT:
A positive type resist composition comprising an alkali-soluble novolac resin, a quinonediazide compound and a compound represented by general formula (I): ##STR1## wherein Y.sub.1 to Y.sub.10 each represent a hydrogen atom, a hydroxyl group or an alkyl group, provided that at least one of Y.sub.1 to Y.sub.10 is a hydroxyl group, and X represents one of the groups represented by the following formulas: ##STR2## wherein R.sub.1 to R.sub.3 independently of one another each represent a hydrogen atom or an alkyl group, provided that, as measured by GPC, the pattern area of the component having a molecular weight, converted to polystyrene, 1,000 or below in the alkali-soluble novolac resin is 25% or less based on the total pattern area of the novolac resin from which the pattern area of the unreacted phenol compound is excepted. This positive type resist composition is excellent in the balance between performances such as sensitivity, resolution, heat resistance and adhesive property.

REFERENCES:
patent: 3188210 (1965-06-01), Fritz et al.
patent: 4387152 (1983-06-01), Stahlhofen
patent: 4404272 (1983-09-01), Stahlhofen
Kajita et al. Chemical Abstracts, vol. 117, No. 10, 1992, abstract No. 102439b.
Chemical Abstracts, vol. 97, No. 22, 1982, abstract No. 191249y.

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