Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1984-10-26
1986-01-28
Goodrow, John L.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427436, 430315, 430319, H05K 318
Patent
active
045670625
ABSTRACT:
Process for preparing multilayer printed circuits comprising laminating simultaneously or sequentially to a substrate bearing a circuit pattern two photopolymerizable layers, the lower layer formulated for bulk response as defined and the upper layer formulated for surface response as defined; exposing the laminate to actinic radiation through a circuit image related to the circuit pattern on the substrate; embedding finely divided metal, e.g., copper, to the tacky image areas; exposing the toned laminate to actinic radiation through an image of at least one overlying segment of the conductive circuit pattern; removing unexposed photopolymer from the two layers to form vias; embedding finely divided metal, e.g., copper, or catalyst to the side walls of the vias; optionally, curing the image by exposing to actinic radiation and/or by heating; plating to form an interconnected electrically conductive circuit. Additional circuit layers can be added by repeating the process using the newly plated circuit pattern as a substrate.
REFERENCES:
patent: 4157407 (1979-06-01), Peiffer
patent: 4329620 (1982-09-01), Cyr et al.
patent: 4360570 (1982-11-01), Andreades et al.
patent: 4454168 (1984-06-01), Fritz
E. I. Du Pont de Nemours and Company
Goodrow John L.
LandOfFree
Process for photoformed plastic multistrate using two layer film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for photoformed plastic multistrate using two layer film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for photoformed plastic multistrate using two layer film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1305775