Method of projecting exposure with a focus detection mechanism f

Details Method of projecting exposure with a focus detection mechanism f Method of projecting exposure with a focus detection mechanism f

1994-10-07

1996-01-09

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

355 55, 250548, G01J 120

Patent

active

054830567

ABSTRACT:
A method of projection exposure of a shot area on a substrate to a mask pattern by detecting, by a focus detection mechanism, an amount of defocus, in the axial direction of a projection optical system, of a measuring point on the substrate with reference to the focal plane of the projection optical system, then loading the substrate, and moving the substrate to a predetermined height by a Z-stage movable in the axial direction of the projection optical system, based on the value detected by the focus detection mechanism; thereby exposing a shot area of the substrate to the mask pattern.

REFERENCES:
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4866262 (1989-09-01), Van der Werf et al.
patent: 5408083 (1995-04-01), Hirukawa et al.

Affiliated with

Also associated with

Rating

Method of projecting exposure with a focus detection mechanism f does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of projecting exposure with a focus detection mechanism f, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of projecting exposure with a focus detection mechanism f will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1303996