Exposure control apparatus based on a multimetering system

Details Exposure control apparatus based on a multimetering system Exposure control apparatus based on a multimetering system

1985-05-21

1986-01-28

Adams, Russell E.

G03B 708

Patent

active

045667756

ABSTRACT:
A meter sensitivity pattern control method for cameras in which an output of a first light metering circuit for the brightness of an object of principal photographic interest is compared with outputs of a plurality of second light metering circuits for brightness of different portions of the environment surrounding the object by a corresponding number of comparing circuits. Thereby one second light metering circuit having an output which lies in a predetermined range different from the output of the first light metering circuit and another second light metering circuit having an output which lies outside the predetermined range are selected for their different contributions to an exposure value. The thus-differentially weighed outputs of the second light metering circuits are computed with the output of the first light metering circuit producing light value information.

REFERENCES:
patent: 4364650 (1982-12-01), Terashita et al.
patent: 4394078 (1983-07-01), Terashita
patent: 4429969 (1984-02-01), Saegusa
patent: 4443080 (1984-04-01), Saegusa

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