Metal recovery from porous materials

Details Metal recovery from porous materials Metal recovery from porous materials

1991-06-28

1992-10-13

Hunt, Brooks H.

Chemistry of inorganic compounds

Treating mixture to obtain metal containing compound

Radioactive metal

252626, 423251, 20415743, B01F 100

Patent

active

051548992

ABSTRACT:
A method for recovering plutonium and other metals from materials by leaching comprising the steps of incinerating the materials to form a porous matrix as the residue of incineration, immersing the matrix into acid in a microwave-transparent pressure vessel, sealing the pressure vessel, and applying microwaves so that the temperature and the pressure in the pressure vessel increase. The acid for recovering plutonium can be a mixture of HBF.sub.4 and HNO.sub.3 and preferably the pressure is increased to at least 100 PSI and the temperature to at least 200.degree. C. The porous material can be pulverized before immersion to further increase the leach rate.

REFERENCES:
patent: 3410668 (1968-11-01), Conner
patent: 4221680 (1980-09-01), Hardwick et al.
patent: 4242220 (1980-12-01), Sato
patent: 4364859 (1982-12-01), Ohtsuka et al.
patent: 4431164 (1984-02-01), Jungo et al.
patent: 4439002 (1984-03-01), Tarutani et al.
patent: 4444723 (1984-04-01), Matsumaru et al.
patent: 4528130 (1985-07-01), Ledebrink et al.
patent: 4565670 (1986-01-01), Miyazaki et al.
patent: 4749519 (1988-06-01), Koehly et al.
patent: 4772431 (1988-09-01), Aubert
patent: 5008044 (1991-04-01), Hanulik
Nadkarni, R. A., "Applications of Microwave Oven Sample Dissolution in Analysis", Anal. Chem., 1984 pp. 2233-2237.

Affiliated with

Also associated with

Rating

Metal recovery from porous materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metal recovery from porous materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal recovery from porous materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1298887