Apparatus and method for selective electrochemical etching

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

20412943, 20412965, 20412975, 204224M, 204228, 204DIG9, C25F 312, C25F 700

Patent

active

043034829

ABSTRACT:
An apparatus and method for selectively electrochemically etching a surface is described. The use of the apparatus and the related method allows the establishment of etched planar surface which may be inclined with respect to the original surface.
The apparatus has a cathode and multiple connectors which attach to the workpiece whose surface is to be etched. When the apparatus is operated the potential of the connectors are set so that the cathode is at least as negative as the lowest potential of the connectors.

REFERENCES:
patent: 2656496 (1953-10-01), Sparks
patent: 3265599 (1966-08-01), Soonpaa
patent: 3268781 (1966-08-01), Lecan et al.
patent: 3325384 (1967-06-01), Frantzen
patent: 3536600 (1970-10-01), Van Dijk et al.
patent: 4002511 (1977-01-01), Magdo et al.
patent: 4069121 (1978-01-01), Baud et al.
patent: 4180439 (1979-12-01), Deines et al.
patent: 4197142 (1980-04-01), Bozler et al.
Keyes, R. W., "Electrolytic Machining of Ink Jet Nozzles", IBM Tech. Discl. Bulletin, vol. 20, No. 7, Dec. 1977, p. 2912.
Hoare, J. P. et al., "Electrochemical Machining", Sci. Amer., Jan. 1974, p. 30.
Cutillo, J. G. et al., "Evaluating Electrochemical Baths", IBM Tech. Discl. Bul., vol. 13, No. 3, Aug. 1970, p. 726.
Potemski, R. M., "Anodic Angle Etching", IBM Tech. Discl., vol. 18, No. 4, Sep. 1975, p. 1223.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for selective electrochemical etching does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for selective electrochemical etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for selective electrochemical etching will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1295692

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.