Polymer containing perfluoroalkyl group, process for preparing t

Chemistry of carbon compounds – Miscellaneous organic carbon compounds

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

424 71, 424 78, 525103, 525117, 525119, 525143, 525176, 525183, 525207, 525328, 525348, 525359, 526242, C08F 824, C08F 818, C08F22206

Patent

active

042552990

ABSTRACT:
A polymer containing perfluoroalkyl group in its side chain which is an addition reaction product of a polymer having the following general formula: ##STR1## wherein R is phenyl group or alkoxyl group having 1 to 12 carbon atoms, R.sup.1 is alkyl group having 1 to 12 carbon atoms, and n is an integer of 10 to 2,000, with an epoxy compound selected from the group consisting of ##STR2## wherein R.sub.f is perfluoroalkyl group having 3 to 20 carbon atoms and R.sup.2 is alkyl group having 1 to 12 carbon atoms, the addition reaction product containing 0.1 to 50% by mole of the group derived from the epoxy compound having the formulae (IIa) to (IIc) per 1 mole of the recurring unit of the polymer having the formula (I). The polymer is good in compatibility with film-forming resins and solvents and improves the leveling property of a coating composition when incorporated thereinto and the surface smoothness of the film obtained from the composition.

REFERENCES:
patent: 3250734 (1966-05-01), Sekmakas
patent: 3876589 (1975-04-01), Wasley et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Polymer containing perfluoroalkyl group, process for preparing t does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polymer containing perfluoroalkyl group, process for preparing t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymer containing perfluoroalkyl group, process for preparing t will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1293310

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.