Projection exposure apparatus and microdevice manufacturing meth

Details Projection exposure apparatus and microdevice manufacturing meth Projection exposure apparatus and microdevice manufacturing meth

1995-04-20

1998-09-08

Pendegrass, Joan H.

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

355 53, 355 55, H01L 2130

Patent

active

058052739

ABSTRACT:
A projection exposure apparatus includes a projection optical system for projecting a pattern of a first object onto a second object, and a correcting device for substantially correcting rotational asymmetry in optical characteristic of the projection optical system to be produced in the projection optical system with an exposure process.

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patent: 5583696 (1996-12-01), Takahashi
Proceedings, SPIE--The International Society for Optical Engineering, "Optical/Laser Microlithography V", John D. Cuthbert, vol. 1674, Part 1 of 2, Mar. 11-13, 1992.
Patent Abstracts of Japan, Kokai No. 60-007,189, vol. 9, No. 118, 58 E 316, May 1985.
Soviet Inventions Illustrated, Patent No. 1,569,788, P-9105, Mar. 1991.

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