Exposure apparatus

Details Exposure apparatus Exposure apparatus

1987-01-16

1988-02-09

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

G03B 2742

Patent

active

047244666

ABSTRACT:
An exposure apparatus for use in manufacturing a semiconductor device which includes a KrF laser as an Excimer laser, a reduction projective type exposure optical system for applying laser beam emitted the laser on a wafer, and a support with vibration absorption function on which the KrF laser is mounted separately from the exposure optical system. The light axis of a light path between the KrF laser and the exposure optical system coincides with direction of vibration which is absorbed in the support.
Thereby, shock wave produced from KrF laser upon discharge operation may be absorbed in said support without giving any bad effect to other components.

REFERENCES:
patent: 4422754 (1983-12-01), Isohata et al.
patent: 4464030 (1984-08-01), Gale et al.
patent: 4595282 (1986-06-01), Takahashi
patent: 4653903 (1987-03-01), Torigoe et al.
patent: 4676630 (1987-06-01), Matsushita et al.

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1286013