Positively operating radiation-sensitive mixture containing a po

Details Positively operating radiation-sensitive mixture containing a po Positively operating radiation-sensitive mixture containing a po

1990-01-12

1993-03-30

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430192, 430193, 534556, 534558, G03F 7023, C07C24518

Patent

active

051983222

ABSTRACT:
A positively operating radiation-sensitive mixture comprising a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, and as a photoactive component a polyfunctional .alpha.-diazo-.beta.-keto ester of the general formula I ##STR1## in which R.sup.1 denotes an aliphatic, cycloaliphatic or araliphatic or aromatic radical having 4 to 20 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by ##STR2## or NH groups and/or contain keto groups, X denotes an aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by the groups --NR.sup.2 --, --C(O)--O--, --C(O)--NR.sup.2 --, --C(O)-- ##STR3## --NR.sup.2 --C(O)--NR.sup.3 --, --O--C(O)--NR.sup.2 --, --C(O)-- ##STR4## or --O--C(O)--O--, or CH groups can be replaced by ##STR5## in which R.sup.2 and R.sup.3 independently of one another represent hydrogen or an aliphatic, carbocyclic or araliphatic radical,

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Patent Abstracts, vol. 99, 1983, 99:53746y Bicycle diazodiketocyclopentanes U.S.S.R. SU 1,004,359.
Willson et al., "New Diazoketone Dissolution Inhibitors for Deep U.V. Photolithography," Advances in Resist Technology and Processing IV, Mar. 2-3, 1987, pp. 2-10.
Sugiyama et al., "Positive Excimer Laser Resists Prepared with Aliphatic Diazoketones," SPIE Proc., 920, 51, 1988, pp. 51-61.

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