Method of forming trench isolation structure with germanium sili

Details Method of forming trench isolation structure with germanium sili Method of forming trench isolation structure with germanium sili

1991-12-09

1993-03-02

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437 61, 148DIG50, H01L 2176

Patent

active

051908891

ABSTRACT:
A trench structure (10) using germanium silicate. The trench structure (10) has a substrate material (12) and a hard mask material (14) that overlies the substrate material (12). An opening is formed in the hard mask material and the opening is used to form a trench (16) in the substrate material (12). The trench (16) has a sidewall portion and a bottom portion. A barrier (18 and 20) is formed overlying the bottom portion of the trench (16) and adjacent to the sidewall portion of the trench (16). A planar germanium silicate region (22) is formed overlying the barrier (18 and 20).

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