Reduction of hot carrier effects in semiconductor devices by con

Fishing – trapping – and vermin destroying

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437 31, 437 32, 437 41, 437 44, 437 81, H01L 21328, H01L 21336

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051089351

ABSTRACT:
This invention discloses a method for reducing hot carriers in a transistor structure by means of increasing the scattering rate of the carriers. The increased scattering rate is accomplished by introducing scattering sites comprising of non-conventional dopants, an element which is not boron, phosphorous, or arsenic, into the base or channel region of a transistor.

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Suppression of Hot-Carrier Degradation in Si MOSFETs by Germanium Doping; Kwok K. Ng et al.; IEEE, vol. 11, No. 1, Jan. 1990, pp. 45-47.
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Hot-Electron Substrate-Current Generation During Switching Transients; Hsu et al., IEEE; vol. ED 32, No. 2, Feb. 1985, p. 394.
A New LDD Transistor with Inverse T Gate Structure, Huang et al.; IEEE, Apr. 1987, pp. 451-453.

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