Method of forming silicon dioxide glass films

Details Method of forming silicon dioxide glass films Method of forming silicon dioxide glass films

1990-07-27

1991-07-02

Chaudruri, Olik

Fishing, trapping, and vermin destroying

437240, 437235, 148DIG118, 4272553, 4272552, 4272551, 423336, 423337, H01L 21285

Patent

active

050285661

ABSTRACT:
The manufacture of semiconductor devices and, specifically, deposition of SiO.sub.2 films on semiconductor devices by oxidative decomposition of oligo siloxanes at low temperature is disclosed.

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