Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1984-06-20
1986-06-03
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430321, 430945, 427142, 427 531, 219121LE, 219121LF, G03F 900, B23K 900
Patent
active
045929750
ABSTRACT:
A method for repairing clear defects on a photomask. The method includes the steps of coating the photomask with a positive photoresist; exposing the photoresist to a laser beam for localized heating thereof to a temperature above 500.degree. C. to darken or char the polymer; and removing the unexposed polymer from the photomask. The method may also include the intermediate step of heating the polymer to a temperature between 200.degree. C. and 500.degree. C. to brown the polymer before the polymer is exposed to the laser which heats it to a temperature above 500.degree. C.
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Beranek Mark W.
Oprysko Modest M.
Young Peter L.
Dees Jos,e G.
Edgell G. Paul
Gould Inc.
Kittle John E.
Sachs Edward E.
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