Method for repairing a photomask by laser-induced polymer degrad

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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430321, 430945, 427142, 427 531, 219121LE, 219121LF, G03F 900, B23K 900

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045929750

ABSTRACT:
A method for repairing clear defects on a photomask. The method includes the steps of coating the photomask with a positive photoresist; exposing the photoresist to a laser beam for localized heating thereof to a temperature above 500.degree. C. to darken or char the polymer; and removing the unexposed polymer from the photomask. The method may also include the intermediate step of heating the polymer to a temperature between 200.degree. C. and 500.degree. C. to brown the polymer before the polymer is exposed to the laser which heats it to a temperature above 500.degree. C.

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