Electroplating composition and process and surfactant compound f

Chemistry: electrical and wave energy – Processes and products

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204 451, 204 55R, 204DIG2, 260512C, C07C14338, C25D 322, C25D 356

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active

045928096

ABSTRACT:
Non-ionic surfactants prepared by reaction of ethoxylated bisphenols and sulfating agents such as sulfamic acid, sulfuric acid and chlorosulfonic acid are employed in metal electroplating baths and processes to increase the useful operating temperature limits of the baths in comparison to those using other non-ionic surfactants. The surfactants are particularly useful as additives in acid zinc electroplating baths, and especially acid zinc electroplating baths either completely devoid of ammonium ion or containing low amounts of ammonium ion.

REFERENCES:
patent: 1421722 (1922-07-01), Romer et al.
patent: 3729394 (1973-04-01), Hsu et al.
patent: 3766024 (1973-10-01), Yamagishi et al.
patent: 3787296 (1974-01-01), Hayashida et al.
patent: 4070256 (1978-01-01), Hsu et al.
patent: 4502926 (1985-03-01), Barber
patent: 4512856 (1985-04-01), Paneccasio
patent: 4514267 (1985-04-01), Lash
patent: 4515663 (1985-05-01), Strom et al.
patent: 4528075 (1985-07-01), Anchor et al.
patent: 4532051 (1985-07-01), Nuckels et al.
patent: 4541906 (1985-09-01), Martin

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