Surface processing method effected for total-reflection X-ray fl

Details Surface processing method effected for total-reflection X-ray fl Surface processing method effected for total-reflection X-ray fl

1994-12-19

1997-11-11

Soderquist, Arlen

Chemistry: analytical and immunological testing

Including sample preparation

Liberation or purification of sample or separation of...

436 73, 436 80, 436 81, 436 83, 436 84, 436172, 436174, 436175, 378 44, 378 70, 378 79, 378 86, 1566261, 134902, G01N 100, G01N 2170, G01N 3320

Patent

active

056863144

ABSTRACT:
A surface processing method effected before the total-reflection X-ray fluorescence analysis is effected is disclosed. The surface processing is to modify all of the contaminants attached at least to the measurement surface of the wafer into particle-shaped residues. For this purpose, the measurement surface of the wafer is first dissolved by hydrofluoric acid to form a large number of droplets on the measurement surface. Next, the thus formed droplets are dried with the position thereof kept unchanged. After the drying, contaminants attached to the measurement surface of the wafer are left as particle-shaped residues. After this, the measurement surface of the wafer is analyzed by the total-reflection X-ray fluorescence analyzing method.

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