Photoactive compounds having a heterocyclic group used in photor

Details Photoactive compounds having a heterocyclic group used in photor Photoactive compounds having a heterocyclic group used in photor

1995-05-24

1996-05-07

Chu, John S. Y.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, 534557, G03F 7023

Patent

active

055145159

ABSTRACT:
A new photoactive compound for use in the formulation of a photoresist comprises a bisphenol compound having an alkyl linkage substituted with a heterocyclic group. The new photoactive compound may be admixed with an alkali soluble resin to formulate a photoresist composition. The new photoactive compounds exhibit enhanced long term solubility in conventional photoresist solvents.

REFERENCES:
patent: 5248582 (1993-09-01), Uenishi et al.
patent: 5424167 (1995-06-01), Uetani et al.

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