Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Antihalation or filter layer containing
Patent
1998-07-16
1999-11-23
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Antihalation or filter layer containing
430533, 428480, 524 86, 524218, 524290, 524291, 524292, G03C 1795, G03C 1815, C08K 534, C08K 548
Patent
active
059897945
ABSTRACT:
Disclosed is a polyalkylene naphthalate film, preferably the homopolymer of naphthalene-2,6-dicarboxylic acid and ethylene glycol (PEN), comprising a UV absorbing compound of general formula Q--CO--CO--X (explained in the description) for quenching of the UV fluorescence at 429 nm. The polymeric film is preferably used as support for a photographic material, preferably a colour negative or colour reversal photographic material.
REFERENCES:
patent: 5593818 (1997-01-01), Kawamoto
patent: 5688636 (1997-11-01), Kiekens
H. Laver: "The Use of UV-Absorbers in X-Ray Photographic Films," Research Disclosure No. 248, Dec. 1984, Havant GB, p. 598, XP002054694.
Agfa-Gevaert N.V.
Schilling Richard L.
LandOfFree
Polyalkylene naphthalate comprising specific UV-absorber does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polyalkylene naphthalate comprising specific UV-absorber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polyalkylene naphthalate comprising specific UV-absorber will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1219984